application:
widely applied in sio gas phase collection, silicon anode gas phase collection and silicon monoxide gas phase collection, it is horizontal open door high vacuum induction furnace, high temperature area heating process, low temperature area gas phase deposition collection, widely used in the high temperature preparation and collection of sio and other materials.
2.configuration:
380v±5%，50hz/60hz 3 phase 5 wire
one control cabinet to one furnace.
the facility equipped of cooling tower or gas purifier for optional.
technology parameter:
|
model no. |
rated power(kw) |
working size（mm) |
collection area capacity(l) |
max. working temperature |
heating zone |
temperature control accuracy |
ultimate vacuum(pa) |
|
nti-qxsjl-40w |
40 |
ϕ400x500 |
31 |
sintering area 1400℃, collection area 1100℃ |
2 |
±1℃ |
10-3 |
|
nti-qxsjl-60w |
60 |
ϕ500x1050 |
103 |
sintering area 1400℃, collection area 1100℃ |
2 |
±1℃ |
10-3 |
|
nti-qxsjl-120w |
120 |
ϕ600x1200 |
282 |
sintering area 1400℃, collection area 1100℃ |
2 |
±1℃ |
10-3 |
