refractory materials graphitization lab furnace-尊龙凯时注册

refractory materials graphitization lab furnace

type:laboratory furnace

input size:custom made

applications:nt-cvd (g) series high temperature vacuum tube furnace specially designed for high temperature cvd craft, such as zno nanostructures with controllable growth, silicon nitride film plating, ceramic substrate electrical conductivity test, ceramic capacitors (mlcc) sintering atmosphere and so on.

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overview
specifications
features

application :

the equipment mainly used in the ht heating treatment on carbon material, carbon nano, carbon fiber, negative electrode materials, graphite powder, contacting terminal material and such related material.

the furnace picture:

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all our furnace can be custom made:

		nti-sml-4l	nti-sml-9l	nti-sml-57l
working size （l×w×h）	mm	150×250	200×300	350×600
heating type	/	induction heating
power control	/	igbt or silicon controlled
max.capacity	l	4	9	57
loading capacity	g	ht area capacity×product’s density(g/cm³)×1000 1l=1000cm³
input voltage	/	380v±10%，50hz/60hz 3 phase 5 wire
equipment structure	/	one power to one or two or four furnace
type	/	vertical
power	kw	80	100	150
frequency	hz	8000	8000	2500
max. temperature	℃	3200	3200	2800
working tem.	℃	3000	3000	2800
tem.uniformity	℃	±10	±10	±10
working environment	/	vacuum or ar、n₂atmospher environment (micro-positive pressure)

case

1.application: the equipment is batch type induction furnace, mainly used in tungsten carbide, silicon carbide, boron carbide, polysilicon material, calcium carbide, rare earth oxide, radiation proof material, zirconia, sapphire, metal, billets, powder m

brief introduction